The focus of this paper is the application of Fourier transform infrared spectroscopy (FTIR) and near infrared-tuneable diode laser spectroscopy (NIR-TDLAS) as in-situ tools to monitor the formation of gas phase products during atomic layer deposition (ALD). Two studies are chosen to highlight the importance of monitoring the gas phase, in this surface driven process, for both mechanistic and reactor dynamics considerations. The first study is the FTIR monitoring of the ALD of HfO2, from Hf[N(CH3)2]4 and H2O where it was found that, in addition to the expected HN(CH3)2, gas phase species were generated including CO, CH4 and HCN. The.
Two thin film absorbers are presented in this paper: one for the visible (VIS) and the near-infrared (NIR) spectra in the wavelength range of 350"1000nm, the other for the short-wavelength infrared (SWIR) spectrum in the wavelength range of 1200"2000nm. First, the refractive indices were determin...
The objective of the study was to characterize and map changes in lignin during hydrothermal and wet explosion pre-treatments of wheat straw and corn stover. Chemical composition, microscopic (atomic force microscopy and scanning electron microscopy) and spectroscopic (attenuated total reflectanc...
Optical properties of fluorine doped diamond-like carbon (F:DLC) films deposited by the direct current plasma enhanced chemical vapor deposition (PECVD) technique were studied in detail. Surface morphologies of the F:DLC films were studied by an atomic force microscope, which indicated surface ro...
Thin films from acrylic acid and Ar mixtures were deposited on polypropylene films, aluminum foils and silicon 100 wafers by radiofrequency (RF) plasma polymerization. Different deposition conditions were investigated, varying the gas-mixture feed composition and the reactor geometry. For every t...
Tetrakis(ethylmethylamido)hafnium and water are commonly used precursors for atomic layer deposition of HfO2. Using reflection absorption infrared spectroscopy with a buried-metal-layer substrate, we probe surface species present during typical deposition conditions. We observe evidence for therm...
We have investigated the relation between the structure and morphology of TiN coatings with their optical properties. Samples were deposited by magnetron sputtering and, by changing the deposition parameters, different textures and chemical compositions can be obtained as measured by X-ray diffra...
Pt films with a thickness of 3 to 15nm were grown by vapor deposition on atomically smooth α-Al2O3(0001) single-crystal surfaces and characterized by scanning tunneling microscopy (STM), atomic force microscopy, cyclic voltammetry, Auger electron spectroscopy and Fourier transform infrared spect...
Using the methods of Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, X-ray diffraction in the geometry of the grazing beam, and Fourier transform infrared spectroscopy, we studied the chemical composition and structure of thin films of titanium dioxide formed by atomic l...
The use of the far"-infrared spectral range presents a novel approach for analysis of the hydrogen bonding in proteins. Here it is presented for the analysis of FeS vibrations (500-200"cm-1) and of the intra"- and intermolecular hydrogen bonding signature (300-50"cm-1) in the Rieske protein...
Silicon nitride films have been deposited at a low temperature (70oC) by inductively coupled plasma chemical vapor deposition (ICP-CVD) technique and their physical and chemical properties were studied. For a deposited SiN sample, β-phase was observed and refractive index of 2.1 at 13.18nm/min d...
